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SOLVED: In semiconductor manufacturing, wet chemical etching is oftenused to remove silicon from the backs of wafers prior tometallization. The etch rate is an important characteristicin this process and known to follow a normal distribution. Twodi erent etching solutions have been compared, using tworandom samples of 10 wafers for each solution. The observedetch rates are as follows (in mils per minute):Solution 1 9.9 9.4 9.3 9.6 10.2 10.6 10.3 10.0 10.3 10.1Solution 2 10.2 10.6 10.7 1
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