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Extreme ultraviolet lithography extends photolithography ... which reflect light through interlayer interference. Such coatings perform particularly well with 13.5 nm light. Even with these ...
Plymouth Grating Laboratory has established the first commercial production system using Scanning Beam Interference Lithography (SBIL) to manufacture gratings and Nanoruled surface structures that can ...
The processing has been developed and demonstrated with an interferometric lithography tool. Ongoing work focuses on adapting this to projection tools though the use of new mask technologies.
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