UMass Amherst researchers have developed a laser-based holographic alignment method that could revolutionize overlay accuracy in semiconductor manufacturing, though its industrial adoption may hinge ...

Extreme ultraviolet lithography extends photolithography ... which reflect light through interlayer interference. Such coatings perform particularly well with 13.5 nm light. Even with these ...

The processing has been developed and demonstrated with an interferometric lithography tool. Ongoing work focuses on adapting this to projection tools though the use of new mask technologies.