FZ Jülich is researching how this radiation can be used for EUV interference lithography. ASML's EUV imagesetter Twinscan NXE:3400 from the inside. A laser shoots plasma droplets to generate ...

The processing has been developed and demonstrated with an interferometric lithography tool. Ongoing work focuses on adapting this to projection tools though the use of new mask technologies.

Plymouth Grating Laboratory has established the first commercial production system using Scanning Beam Interference Lithography (SBIL) to manufacture gratings and Nanoruled surface structures that can ...

Extreme ultraviolet lithography extends photolithography ... which reflect light through interlayer interference. Such coatings perform particularly well with 13.5 nm light. Even with these ...