For example, Applied Materials introduced its first atomic layer deposition chamber in 2001. THIS DEFINITION IS FOR PERSONAL USE ONLY. All other reproduction requires permission.

We have arrived at the age where atomic level precision in the fabrication of semiconductor devices is needed to keep improving PPA. Thus, advanced film fabrication techniques that provide precise ...

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph ...

Figure shows the application of ALD in the manufacturing and interfacial control of advanced catalytic and energy materials, including the interfacial performance control of the automotive exhaust ...

This study presents a novel approach to depositing crystalline β-Ga₂O₃ films at low temperatures (as low as 200°C) using Plasma-Enhanced Atomic Layer Deposition (PEALD). Image Credit ...

Atomic layer etching (ALE) is the reverse of atomic layer deposition (ALD). ALE can be achieved using sequential, self-limiting thermal reactions. We have recently demonstrated Al 2 O 3 ALE [1-3] and ...

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We focus on atomic layer deposition (ALD), atomic layer etching (ALE), and molecular layer deposition (MLD). We develop the science and engineering of atomic layer processing (ALP).

The Fiji is a modular high-vacuum ALD system that accommodates a wide range of deposition modes using a flexible system architecture and multiple configurations of precursors and plasma gases. The ...

Platform for research and education in atomic layer level materials processing ALD center Finland is a national, centralized open access platform for research and education in atomic layer level ...

Atomic layer deposition (ALD) is a process used to deposit a wide variety of thin film materials from the vapor phase of matter. The system involves alternating pulses of gaseous precursors that ...