AZoNano

Atomic Layer Deposition vs Chemical Vapor Deposition

The term "ALD" was first used around 2000. This technique achieves atomic layer control and conformal deposition through successive, self-limiting surface reactions. It involves introducing chemical ...
AZOM

Integrating a Mass Spectrometer in an Atomic Layer Deposition (ALD) System

Surface decomposition reactions and growth mechanisms are the key influences on the physicochemical properties of the deposited films. It is therefore essential to fully characterize and understand ...
Nanowerk

ALD (Atomic Layer Deposition)

ALD is based on the sequential use of a gas phase chemical process. The ALD cycle consists of four main steps: (1) pulsing of a precursor A, (2) purging of the reactor to remove excess precursor and ...
Semiconductor Engineering

Research Bits: Jan. 20

ALD for Ru wiring; vertical nanolasers; hydrogel semiconductors.
Nanowerk

Advancing 2D MXene engineering with precious metals atomic layer deposition

(Nanowerk News) A team of researchers, led by Professor Soo-Hyun Kim in the Graduate School of Semiconductors Materials and Devices Engineering and the Department of Materials Science and Engineering ...
Semiconductor Engineering

Large Area Process For Atomically Thin 2D Semiconductor, Using Scalable ALD

A new technical paper titled “Large-area synthesis of high electrical performance MoS 2 by a commercially scalable atomic layer deposition process” by researchers at the University of Southampton, LMU ...
Nature

Atomic Layer Deposition and Area-Selective Deposition Techniques

The fabrication of nanoscale devices increasingly relies on techniques that offer atomic‐scale precision, with Atomic Layer Deposition (ALD) and Area-Selective Deposition (ASD) at the forefront. ALD ...
Nature

Atomic Layer Deposition of Ruthenium Thin Films

Atomic layer deposition (ALD) has emerged as a critical technique for fabricating ultrathin films with atomic-scale precision. In particular, ruthenium thin films are of great interest in the ...
Business Wire

AVACO Unveils Enhanced Energy Conversion Efficiency Through Innovative Buffer Layer Using ALD Process for Solar Cell

SAN JOSE, Calif.--(BUSINESS WIRE)--AVACO, specializing in the manufacture of sputtering (PVD) vacuum deposition equipment and atomic layer deposition (ALD) equipment, today announced the development ...
AZoNano

Atomic Layer Deposition Method Reduces Use of Precious Metals

Researchers at UNIST’s Graduate School of Semiconductors Materials and Devices Engineering and Department of Materials Science and Engineering, under the direction of Professor Soo-Hyun Kim, have made ...
Optics

LZH’s Spatial ALD system uniformly coats complex shaped optics

With its newly-developed “Spatial ALD” deposition system, Laser Zentrum Hannover can now also uniformly coat complex-shaped optics. The innovative system achieves higher deposition rates than ...